A quantum leap for process chromatography!

Design based on 30 years of experience, its architecture has been thought with performance, reliability and ease of maintenance in mind.

Parallel chromatography

Measure simultaneously multiple analytes at ppt, ppb, ppm and % levels

Simplified

chromatography

Reduce chromatographic front-end complexity

Based on Epd technology*

Superior to every plasma-based technology available

Embedded GC software with industrial operating system

Industrial Touch Screen Display

Industrial IOs (4-20 mA, relays)

Internal data storage

Reduced carrier gas consumption with leak free electronics inline pressure regulator

Based on ASDevices µInProve GC valve

Designed for IIoT

Remote connectivity

19'' rackmount design

(497 x 312 x 563 mm)

(19,6 x 12,3 x 22,2 in)

Application capabilities

Air separation plant

Semiconductor plant

Argon purification plant

Hydrogen purification plant

Speciality gas laboratories

Cryogenic truck loading

Helium production plant

Medical gas

Unsurpassed performance with Epd technology

The versatility and the precision of the KaPlus8000 can be achieved because of our unique Epd technology*. This technology, which surpasses other commercially available plasma technology, is characterised by two main innovative features. 

Stabilising / Focusing electrodes

Resolve plasma source instability (quenching) and hence signal to noise improvement at low concentration.

Electron injection electrodes

Resolve plasma source instability (quenching) and hence signal to noise improvement at low concentration.

Ease of maintenance

Most process GCs need to be removed from rack for maintenance causing long down time at great expense. The unique patented iMOv design provide access to all key GC components without having to remove it from the rack.

Easy access

Access all key components from the rack

Reduce downtime

Reduce maintenance cost

Leak free electronics inline pressure flow controller

No leak

Purged design allows no leak

Most trace gas process GC uses bypass type pressure regulators in order to avoid carrier gas contamination. The drawback is carrier gas consumption which is wasted in the bypass vent. With the increasing cost of helium, this is a concern. This is no more the case with our unique purged inline pressure regulator.

Reduced carrier consumption

Reduced operational cost

inProve serie gas chromatographic valve

Exceptional leak integrity

Patented insert and purged design

No flow variation

No pressure drop

Ultra compact

Designed for reliability

1,000,000+ actuations lifetime

Chromatographic valves have always been a limiting factor. Not anymore with the InProve GC valve which combines the leak integrity and lifetime of a diaphragm valve with the flow/pressure drop caracteristics of a rotary valve.

Intuitive industrial grade user interface

Chromatographic valves have always been a limiting factor. Not anymore with the InProve GC valve which combines the leak integrity and lifetime of a diaphragm valve with the flow/pressure drop caracteristics of a rotary valve.

Remote connectivity

Access your instrument from anywhere with the remote connectivity feature. You can access it from you phone, tablet or computer.

More than another "Lok"

Reach analytical performance with an industrial/instrumentation double ferrule compression fitting

By using LipLOK on our instruments you benefit from:

Leak detection capability

Better leak integrity

No dead volume

Compatible with the standard industrial double ferrule type

Specifications

Mechanical dimensions

©2018 by Kainstruments